The general goal of my project is to create ferroelectric crystal films using a synthetic technique in which materials are sputtered onto Si substrate simultaneously from three targets, of which the normal is oriented 90° to that of the substrate, in a very oxygen-rich ambient (20-50% O2 in Ar by volume). With three sources, a ternary phase diagram may be obtained in a single experiment. The electrical properties of the ferroelectric films will then be measured using an automatic probe station. The throughput of materials evaluation using this synthetic technique combined with a rapid, automated measurement of critical properties increases dramatically compared to conventional single sample studies. The current materials I am working on are BaTiO3, SrTiO3 and Sn.