Tantalum thin films

OVERVIEW


Electron backscatter diffraction (EBSD) image of a 400 nm Ta film. Note the existence of many grain boundaries, but the lack of well defined grains.

CURRENT WORK



EBSD images of the grain structure of a 400 nm Ta film. The film in the top was thermally cycled in oxygen. The film in the bottom was cycled in UHV.

Currently, graduate students Aaron Vodnick, Mike Lawrence, and Ray Fertig are studying these films. We are particularly interested in:

  • Mechanism of phase transformation
  • Effects of oxygen on the phase transformation process
  • DFT simulations of elastic constants and vacancy energies
  • Analysis of the unique grain boundary structure
  • Effect of temperature on the phase transformation

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    RESOURCES

    REFERENCES

    Knepper, R., R. S. Fertig, S. P. Baker (2008) "Effect of oxygen on the microstructure of phase-transformed tantalum thin films." In preparation.

    Knepper, R. and S. P. Baker (2007). "Coefficient of thermal expansion and biaxial elastic modulus of beta phase tantalum thin films." Applied Physics Letters 90(18): 181908-3.

    Knepper, R., B. Stevens, et al. (2006). "Effect of oxygen on the thermomechanical behavior of tantalum thin films during the b-a phase transformation." Journal of Applied Physics 100: 123508.