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OVERVIEW
Thin films are used in a wide variety of
applications ranging
from
biomedical devices to microchips to chemical barriers. In many
applications, thin films support stresses that exceed the ultimate
strengths of their bulk counterparts by an order of magnitude. These
high stresses can lead to device failure in the form of delamination,
fracture, void formation, etc. Mechanical failure causes device
failure, regardless of whether the film is being used for its chemical,
magnetic, electrical, or mechanical properties. In order to improve
reliability and mitigate failure of devices that utilize thin film
technology, the origin of the high stresses in films must be better
understood.
Dislocation motion is one of the primary mechanisms by which stress is
relaxed in metal films. Consequently, the existence of high stresses in
films points to impediments to dislocation motion. Our group uses
dislocation dynamics simulations to examine the behavior of
dislocations as they relax film stress.
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CURRENT WORK
Inhomogeneous stress field arising from irregular misfit structure in dislocation dynamics simulations
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Currently, graduate student Ray Fertig is using the program PARANOID,developed by Klaus Schwarz at IBM T. J. Watson, to simulate the behavior of many dislocations during film relaxation. Currently, we are interested in:
- Evolution of stress inhomogeneity in thin films
- Effects of stress inhomogeneity of the types of dislocation interactions that occur
- Loading-unloading behavior
- Bauschinger effect due to dislocation interactions
- Dislocation core spreading at amorphous interfaces
- Tension-compression asymmetry during cyclic loading
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REFERENCES
Fertig, R. S. and S. P. Baker (2008). "Threading dislocation interactions in an inhomogeneous stress field: a statistical model." In preparation.
Fertig, R. S., P. Pant, et al. (2008). "Influence of stress inhomogeneity in thin films on strain hardening and threading dislocation interactions." In preparation.
Fertig, R. S. and S. P. Baker (2007). Relationship between film stress and dislocation microstructure evolution in thin films. Microelectromechanical Systems -- Materials and Devices, edited by D. LaVan, M. Spearing, S. Vengallatore, M. da Silva (Mater. Res. Soc. Symp. Proc. Volume 1052, Warrendale, PA, 2007), DD-07-06.
Pant, P., K. W. Schwarz, et al. (2006). "Dislocation dynamics simulations of plastic deformation in thin films." Unpublished.
Pant, P., K. W. Schwarz, et al. (2003). "Dislocation interactions in thin FCC metal films." Acta Materialia 51(11): 3243-3258.
Baker, S. P., R. M. Keller-Flaig, et al. (2003). "Bauschinger effect and anomalous thermomechanical deformation induced by oxygen in passivated thin Cu films on substrates." Acta Materialia 51(10): 3019-3036.
Shu, J. B., S. B. Clyburn, et al. (2003). "Effect of oxygen on the thermomechanical behavior of passivated Cu thin films." Journal of Materials Research 18(9): 2122-2134.
Baker, S. P., L. Zhang, et al. (2002). "Effect of dislocation core spreading at interfaces on strength of thin-films." Journal of Materials Research 17(7): 1808-1813.
Gao, H. J., L. Zhang, et al. (2002). "Dislocation core spreading at interfaces between metal films and amorphous substrates." Journal of the Mechanics and Physics of Solids 50(10): 2169-2202.
Baker, S. P., R. P. Vinci, et al. (2002). "Elastic and anelastic behavior of materials in small dimensions." MRS Bulletin 27(1): 26-29.
Vinci, R. P. and S. P. Baker (2002). "Mechanical properties in small dimensions." MRS Bulletin 27(1): 12-14.
Baker, S. P., A. Kretschmann, et al. (2001). "Thermomechanical behavior of different texture components in Cu thin films." Acta Materialia 49(12): 2145-2160.
Baker, S. P. (2001). "Plastic deformation and strength of materials in small dimensions." Materials Science and Engineering A 319-321: 16-23.
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